NODIRA MUSTAFOEVA1, ALLANAZAR TASHATOV2, BÜNYAMIN SAHIN3. STUDY OF THE EFFECT OF Ni⁺ ION IMPLANTATION ON THE NEAR-SURFACE LAYERS OF SILICON USING MODERN ANALYSIS METHODS. International Multidisciplinary Journal for Research & Development, [S. l.], v. 13, n. 03, p. 735–737, 2026. Disponível em: https://www.ijmrd.in/index.php/imjrd/article/view/5411. Acesso em: 26 mar. 2026.