Nodira Mustafoeva1, Allanazar Tashatov2, Bünyamin Sahin3. “STUDY OF THE EFFECT OF Ni⁺ ION IMPLANTATION ON THE NEAR-SURFACE LAYERS OF SILICON USING MODERN ANALYSIS METHODS”. International Multidisciplinary Journal for Research & Development, vol. 13, no. 03, Mar. 2026, pp. 735-7, https://www.ijmrd.in/index.php/imjrd/article/view/5411.