Nodira Mustafoeva1, Allanazar Tashatov2, Bünyamin Sahin3. STUDY OF THE EFFECT OF Ni⁺ ION IMPLANTATION ON THE NEAR-SURFACE LAYERS OF SILICON USING MODERN ANALYSIS METHODS. imjrd [Internet]. 2026 Mar. 26 [cited 2026 Mar. 26];13(03):735-7. Available from: https://www.ijmrd.in/index.php/imjrd/article/view/5411